Particle removal from semiconductor wafers by megasonic cleaning

Journal of Aerosol Science

Volumn 27, Issue Suppl 1, 1996, Pages

  Kuehn, T H ^a   Kittelson, D B ^a   Wu, Y ^a   Gouk, R ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC TRANSDUCERS; ACOUSTIC WAVE REFLECTION; ACOUSTIC WAVE TRANSMISSION; COMPUTER SIMULATION; HYDROPHONES; INTEGRATION; PRESSURE EFFECTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS; SURFACE CLEANING; VECTORS; VELOCITY MEASUREMENT;

ACOUSTIC RAY METHOD; COMPONENT INTEGRATION METHOD; MEGASONIC CLEANING TANK;

SILICON WAFERS;

EID: 0030232614     PISSN: 00218502     EISSN: None     Source Type: Journal    
DOI: 10.1016/0021-8502(96)00286-8     Document Type: Article

References (0)