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Volumn 266, Issue 14, 2008, Pages 3330-3331
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900 keV gold ion sputter etching of silicon and metals
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Author keywords
Heavy ion beam lithography; High energy ion sputtering; Ion etching
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Indexed keywords
FABRICATION;
HEAVY IONS;
MICROSTRUCTURE;
REACTIVE ION ETCHING;
REACTIVE SPUTTERING;
FABRICATE MICROSTRUCTURES;
HEAVY ION BEAM LITHOGRAPHY;
HIGH ENERGY ION SPUTTERING;
ION ETCHING;
METAL IONS;
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EID: 46549089666
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2008.03.229 Document Type: Article |
Times cited : (7)
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References (12)
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