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Volumn 266, Issue 14, 2008, Pages 3330-3331

900 keV gold ion sputter etching of silicon and metals

Author keywords

Heavy ion beam lithography; High energy ion sputtering; Ion etching

Indexed keywords

FABRICATION; HEAVY IONS; MICROSTRUCTURE; REACTIVE ION ETCHING; REACTIVE SPUTTERING;

EID: 46549089666     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.03.229     Document Type: Article
Times cited : (7)

References (12)
  • 1
    • 46549087898 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors, 2006 Update. .
    • International Technology Roadmap for Semiconductors, 2006 Update. .
  • 12
    • 46549086927 scopus 로고    scopus 로고
    • J.F. Ziegler, M.D. Ziegler, J.P. Biersack, Stopping and Range of Ions in Matter (SRIM), 2006. (www.srim.org).
    • J.F. Ziegler, M.D. Ziegler, J.P. Biersack, Stopping and Range of Ions in Matter (SRIM), 2006. (www.srim.org).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.