Variations of microstructure, conductivity and transparency of Al-doped ZnO thin films prepared by radio frequency magnetron sputtering with target-substrate distances

Vacuum

Volumn 82, Issue 11, 2008, Pages 1216-1219

  Chen, Luo ^a   Bi, Xiaofang ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

Electrical resistivity; Optical properties; r.f. Magnetron sputtering; Thin films

Indexed keywords

CRYSTALLITE SIZE; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; OPACITY; TRANSPARENCY; ZINC OXIDE;

BURSTEIN-MOSS (BM) SHIFT; TARGET-SUBSTRATE DISTANCE;

THIN FILMS;

EID: 46549089499     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.02.008     Document Type: Article

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