Characterization of ZnO plasma in a radio frequency sputtering system

Journal of Applied Physics

Volumn 103, Issue 12, 2008, Pages

  Joshy, N V ^a   Isaac, Johney ^a   Jayaraj, M K ^a  

^a Department of Physics   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC SPECTROSCOPY; CARRIER CONCENTRATION; ELECTRON DENSITY MEASUREMENT; ELECTRON TEMPERATURE; ELECTRONS; EMISSION SPECTROSCOPY; GALLIUM; INERT GASES; LIGHT EMISSION; MAGNETIC FIELDS; MAGNETRONS; MOLECULAR SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; OXIDES; PLASMA DIAGNOSTICS; PLASMAS; RADIO WAVES; SEMICONDUCTING ZINC COMPOUNDS; THICK FILMS; X RAY DIFFRACTION ANALYSIS; X RAY FILMS; ZINC; ZINC ALLOYS; ZINC OXIDE; ZINC SULFIDE;

(1 1 0) SURFACE; AMERICAN INSTITUTE OF PHYSICS (AIP); ARGON GAS PRESSURE; CRYSTALLOGRAPHIC PROPERTIES; ELECTRON DENSITIES; GALLIUM DOPED ZINC OXIDE (ZNO:GA); GLASS SUBSTRATES; LANGMUIR; MAGNETIC (CE); OPTICAL EMISSION SPECTRUM; OPTICAL EMISSIONS; PLASMA PARAMETERS; PLASMA POTENTIALS; PROPAGATION DIRECTIONS; RADIO FREQUENCY (RF) MAGNETRON SPUTTERING; RADIO FREQUENCY (RF) SPUTTERING; RF POWERING; SPATIAL POSITIONING; SPATIAL VARIATIONS; SPUTTERING CONDITIONS; SPUTTERING POWERS; X RAY DIFFRACTION (XRD); ZNO THIN FILMS;

MAGNETRON SPUTTERING;

EID: 46449117649     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2948940     Document Type: Article

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