Developing threshold method for precise profile control of microlens array with high numerical aperture

Guangxue Xuebao/Acta Optica Sinica

Volumn 24, Issue 7, 2004, Pages 869-872

  Dong, Xiaochun ^a   Du, Chunlei ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

Developing threshold; Lithography model; Positive photoresist; Profile control

Indexed keywords

ASPHERICS; PHOTOLITHOGRAPHY; PHOTORESISTS;

ASPHERICAL PROFILE; DEVELOPING THRESHOLD; MICROLENS ARRAY; NUMERICAL APERTURE; PROFILE CONTROL; RELIEF DEPTH;

MICROLENSES;

EID: 4644342489     PISSN: 02532239     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. Su Jinqing, Yao Jun, Du Jinlei et al.. Coding Gray-Tone mask for fabrication of microoptical elements. Acta Optica Sinica, 2001, 21(1): 97-100 (in Chinese)
2. Herzig H P. Microoptics Element System and Application. Zhou Haixian, Wang Yongnian, Chen Yunfang Transl. Beijing: Defence Industry Press, 2002. 110-114 (in Chinese)
3. He Miao, Yi Xinjian, Cheng Zuhai et al.. Research on fabrication and optical performance testing of silicon microlenses array with large F/number. Chin. J. Lasers, 2000, 27(12): 1097-1102 (in Chinese)
4. Dill F H, Hornberger W P, Hauge P S et al.. Characterization of positive photoresist. IEEE Trans. Electron. Devices, 1975, ED-22(7): 445-452
5. Zeng Hongjun, Du Chunlei, Wang Yongru. Profile control of continuous relief MOE in photoresist. Acta Optica Sinica, 2000, 20(5): 691-696 (in Chinese)
6. Zeng Hunjun, Chen Bo, Guo Lvrong et al.. Edge effect and its application in mask moving technique. Opto-Electronic Engineering, 2000, 27(5): 19-22