Edge effect and its application in mask moving technique

Guangdian Gongcheng/Opto-Electronic Engineering

Volumn 27, Issue 5, 2000, Pages 19-22

  Zeng, Hongjun ^a   Chen, Bo ^a   Guo, Lurong ^a   Qiu, Chuankai ^a   Du, Chunlei ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EXPOSURE CONTROLS; FABRICATION; OPTICAL DEVICES; PHOTOLITHOGRAPHY; PRISMS;

MASK EDGE EFFECT; MASK MOVING TECHNIQUE;

MASKS;

EID: 0034290132     PISSN: 1003501X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)