Coding gray-tone mask for fabrication of microoptical elements

Guangxue Xuebao/Acta Optica Sinica

Volumn 21, Issue 1, 2001, Pages 97-100

  Su, J Q ^a   Yao, J ^a   Du, J L ^a   Zhang, Y X ^a   Gao, F H ^a   Guo, Y K ^a   Cui, Z ^a  

^a SICHUAN UNIVERSITY   (China)

Author keywords

Coding gray tone mask; Microoptical elements; Optical lithography

Indexed keywords

IMAGE CODING; IMAGE PROCESSING; MASKS; PHOTOLITHOGRAPHY; PHOTORESISTS;

CODING GRAY TONE MASK; MICROOPTICAL ELEMENT;

OPTICAL DEVICES;

EID: 0034868751     PISSN: 02532239     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

1. Overview of microoptics past, present and future
2. One-step 3D shaping using a grey-tone mask for optical and microelectronic applications
3. Gray-scale masks for diffractive-optics fabrication: 1. Commercial slide imagers
4. Micro-optic fabrication using one-level gray-tone lithography
5. On the diffraction theory of optical images
6. Characterization of positive photoresist