Research on fabrication and optical performance testing of silicon microlenses array with large F/Number

Zhongguo Jiguang/Chinese Journal of Lasers

Volumn 27, Issue 12, 2000, Pages 1097-1102

  He, M ^a   Yi, X J ^a   Cheng, Z H ^a   Huang, G ^a   Liu, L Q ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Ion beam milling; Microlenses array; Photoresist; Point spread function

Indexed keywords

FILLING; ION BEAM LITHOGRAPHY; MICROSCOPES; MILLING (MACHINING); OPTICAL TRANSFER FUNCTION; PHOTOLITHOGRAPHY; SILICON;

CURVATURE COMPENSATION MILLING; F NUMBER; FABRICATION; ION BEAM MILLING; MICROLENSES ARRAY; OPTICAL PERFORMANCE; POINT SPREAD FUNCTION; SILICON MICROLENSES ARRAY;

LENSES;

EID: 0034433677     PISSN: 02587025     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

1. Technique for monolithic fabrication of microlens arrays
2. 128×128 element microlens arrays fabricated by Ar ion beam etching for focal plane device
3. Microlenses fabricated by melting a photoresist on a base layer
4. Preshaping photoresist for refractive microlens fabrication
5. Technique for monolithic fabrication of silicon microlenses with selectable rim angles
6. Step heat-forming photoresist method for expanding the N. A. range of refractive microlens
7. 128×128 element silicon microlens array fabricated by ion beam etching for PtSi IRCCD
8. Fabrication of linear fused quartz microlens array using photolithography and Ar ion beam etching