Sn film deposition on silica glass substrates

Thin Solid Films

Volumn 464-465, Issue , 2004, Pages 146-149

  Hishita, Shunichi ^a   Stryhal, Zdenek ^a,b   Sakaguchi, Isao ^a   Ohashi, Naoki ^a   Saito, Noriko ^a   Haneda, Hajime ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b CHARLES UNIVERSITY   (Czech Republic)

Author keywords

AFM; Silica glass substrate; Single crystalline film; Tin film; Vacuum deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; GRAIN SIZE AND SHAPE; MORPHOLOGY; SINGLE CRYSTALS; SURFACE ACTIVE AGENTS; THICKNESS MEASUREMENT; THIN FILMS; TIN; X RAY DIFFRACTION;

SILICA GLASS SUBSTRATES; SINGLE CRYSTALLINE FILMS; TIN FILMS; VACUUM DEPOSITION;

SILICA;

EID: 4644327775     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.072     Document Type: Article

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