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note
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To achieve optimal pattern quality we recommend flushing the surface with NMP for 3-5 s with a unidirectional solvent flow. This procedure improves the removal by dissolution of the functionalized PLL-g-PEG molecules bound to the photoresist and has the advantage of reducing the risk of contamination of the NMP beaker with functionalized PLL-g-PEG, thus avoiding undesirable adsorption of functionalized PLL-g-PEG molecules on the created, bare niobia background.
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