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Volumn 14, Issue 8, 2004, Pages 749-756

A combined photolithographic and molecular-assembly approach to produce functional micropatterns for applications in the biosciences

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; COST EFFECTIVENESS; DENSITY (SPECIFIC GRAVITY); GRAFTING (CHEMICAL); MOLECULAR DYNAMICS; POLYETHYLENE GLYCOLS; POLYPEPTIDES;

EID: 4644320407     PISSN: 1616301X     EISSN: None     Source Type: Journal    
DOI: 10.1002/adfm.200305182     Document Type: Article
Times cited : (182)

References (42)
  • 35
    • 4644348077 scopus 로고    scopus 로고
    • L. Feuz, A. Rossi, F. Assi, N. D. Spencer, M. Textor, unpublished
    • L. Feuz, A. Rossi, F. Assi, N. D. Spencer, M. Textor, unpublished.
  • 42
    • 4644369622 scopus 로고    scopus 로고
    • note
    • To achieve optimal pattern quality we recommend flushing the surface with NMP for 3-5 s with a unidirectional solvent flow. This procedure improves the removal by dissolution of the functionalized PLL-g-PEG molecules bound to the photoresist and has the advantage of reducing the risk of contamination of the NMP beaker with functionalized PLL-g-PEG, thus avoiding undesirable adsorption of functionalized PLL-g-PEG molecules on the created, bare niobia background.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.