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Volumn 113, Issue 2, 2004, Pages 154-160

Microstructure and electrical characteristics of Cr-Si-Ni films deposited on glass and Si (100) substrates by RF magnetron sputtering

(3) Zhang, Yuqin a Dong, Xianping a Wu, Jiansheng a

a SHANGHAI JIAO TONG UNIVERSITY (China)

Author keywords

Electrical resistivity; Microstructure; Resistive films; Substrates; Surface roughness

Indexed keywords

ANNEALING; CHROMIUM COMPOUNDS; CMOS INTEGRATED CIRCUITS; CRYSTALLIZATION; DIFFUSION; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; NICKEL COMPOUNDS; SILICON COMPOUNDS; SURFACE ROUGHNESS;

CARDIAC PACEMAKERS; FILM STRESS; RESISTIVE FILMS; THIN RESISTOR FILMS;

THIN FILMS;

EID: 4644273898 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5107(04)00402-7 Document Type: Article

Times cited : (18)

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