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Volumn 73, Issue 1, 2000, Pages 116-119
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Cross-sectional TEM investigations of the influence of P+ ions implanted in the Si substrate on the atomic interdiffusion in the Cr-Si system
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Author keywords
[No Author keywords available]
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Indexed keywords
CHROMIUM COMPOUNDS;
CRYSTAL ORIENTATION;
CRYSTALLINE MATERIALS;
DIFFUSION IN SOLIDS;
ELECTRIC CONDUCTIVITY OF SOLIDS;
HEAT TREATMENT;
INTERFACES (MATERIALS);
ION IMPLANTATION;
PHOSPHORUS;
SEMICONDUCTOR DOPING;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
ATOMIC INTERDIFFUSION;
CHROMIUM SILICIDE;
SILICON WAFERS;
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EID: 0033877916
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(99)00446-8 Document Type: Article |
Times cited : (5)
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References (12)
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