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Volumn 73, Issue 1, 2000, Pages 116-119

Cross-sectional TEM investigations of the influence of P+ ions implanted in the Si substrate on the atomic interdiffusion in the Cr-Si system

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; HEAT TREATMENT; INTERFACES (MATERIALS); ION IMPLANTATION; PHOSPHORUS; SEMICONDUCTOR DOPING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0033877916     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00446-8     Document Type: Article
Times cited : (5)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.