Erratum: Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring (Thin Solid Films (2004) 455, 456 (828-836) DOI: 10.1016/j.tsf.2004.06.099)

Thin Solid Films

Volumn 468, Issue 1-2, 2004, Pages 339-346

  Huang, Hsu Ting ^a,b   Terry Jr , Fred L ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b Therma Wave Inc   (United States)

Author keywords

Critical dimension measurement; Process control; Scatterometry

Indexed keywords

EID: 4644232614     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.099     Document Type: Erratum

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20. Animated movies from RTSE data can be found on the author's web site www.eecs.umich.edu/~fredty.
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