Preparation and properties of sputtered nitrogen-doped cobalt silicide film

Thin Solid Films

Volumn 468, Issue 1-2, 2004, Pages 155-160

  Ting, Jyh Hua ^a   Shiau, Shiuann Huah ^b   Chen, Yeong Jyh ^b   Pan, Fu Ming ^a   Wong, Harianto ^c   Pu, Gibson M ^c   Kung, Chung Yuan ^b  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^c Reflectivity Inc   (United States)

Author keywords

Hinge; Reactive sputtering; Reannealing; Stress hysteresis; Taguchi method

Indexed keywords

ANNEALING; CHEMICAL SENSORS; COMPOSITE MICROMECHANICS; LIGHT MODULATION; MICROSTRUCTURE; NITROGEN; REFLECTION; SPUTTER DEPOSITION; SURFACE PHENOMENA; TOUGHNESS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

HINGE; REACTIVE SPUTTERING; REANNEALING; STRESS HYSTERESIS; TAGUCHI METHOD;

COBALT COMPOUNDS;

EID: 4644220110     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.015     Document Type: Article

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