Formation of nickel-based nanocrystal monolayers for nonvolatile memory applications

Applied Physics Letters

Volumn 92, Issue 25, 2008, Pages

  Jang, Yoo Sung ^a   Yoon, Jong Hwan ^a   Elliman, Robert G ^b  

^a Kangwon National University   (South Korea)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; METALS; NANOCRYSTALLINE ALLOYS; NANOCRYSTALS; NANOSTRUCTURES; NANOTECHNOLOGY; NICKEL; NONMETALS; SILICON; SILICON COMPOUNDS;

HIGH-TEMPERATURE ANNEALING; METAL SILICIDES; NANOCRYSTAL LAYERS; NON-VOLATILE-MEMORY APPLICATIONS; SILICON RICH OXIDES; SIMPLE METHODS; SPATIAL DISTRIBUTIONS;

NICKEL ALLOYS;

EID: 46049097965     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2952287     Document Type: Article

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