Evaluation of conductive-to-resistive layers interaction in thick-film resistors

Microelectronics Reliability

Volumn 48, Issue 6, 2008, Pages 881-885

  Mleczko, K ^a   Zawislak Z ^a   Stadler, A W ^a   Kolek, A ^a   Dziedzic, A ^b   Cichosz, J ^c  

^a RZESZOW UNIVERSITY OF TECHNOLOGY   (Poland)

^b WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^c GDANSK UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH; COBALT; COBALT ALLOYS; COBALT COMPOUNDS; COMPUTER NETWORKS; CONDUCTIVE FILMS; CONTACTS (FLUID MECHANICS); FLOW INTERACTIONS; GOLD; METALS; PALLADIUM; PLATINUM; PRECIOUS METALS; RUTHENIUM; RUTHENIUM ALLOYS; SILVER; STANDARDS; STRONTIUM COMPOUNDS; TECHNOLOGY;

COMPATIBLE SYSTEMS; ELSEVIER (CO); EXPERIMENTAL STUDIES; GOLD CONTACTS; LOW FREQUENCY NOISE (1/F NOISE); LOW NOISE; LOW TEMPERATURE CO-FIRED CERAMIC (LTCC); LOW TEMPERATURE CO-FIRED CERAMIC (LTCC) TECHNOLOGY; LOW-SIZE; NOISE PARAMETERS; OPTIMIZED SYSTEMS; RUTHENATE; RUTHENIUM DIOXIDE; SILVER CONTACTS; STRENGTH (IGC: D5/D6); THICK FILM RESISTOR (TFR);

RESISTORS;

EID: 45849097948     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2008.03.012     Document Type: Article

References (17)

1. 2 on the behavior of silver thick-film terminations. IEEE Trans CHMT 11 (1988) 134-136
2. Cattaneo A., Cocito M., Forlani F., and Prudenziati M. Influence of the metal migration from screen-and-fired terminations on electrical characteristics of thick-film resistors. Electrocomp Sci Technol 4 (1977) 205-211
3. See e.g. Jevtić M.M. Noise as a diagnostic and prediction tool in reliability physics. Microelectron Reliab 35 (1995) 455-477
4. γ noise in thick film resistors as an effect of tunnel and thermally activated emissions, from measures versus frequency and temperature. Phys Rev B 27 (1983) 1233-1243
5. Kolek A., Stadler A.W., Zawiślak Z., Mleczko K., and Dziedzic A. Noise and switching phenomena in thick-film resistors. J Phys D 41 (2008) 025303
6. Dutta P., and Horn P.M. Low-frequency fluctuations in solids: 1/f noise. Rev Mod Phys 53 (1981) 497-516
7. Koch R.H. Relationship between low-frequency noise and resistance drift in metal films. Phys Rev B 48 (1993) 12217
8. Kolek A., Ptak P., and Dziedzic A. Noise characteristics of resistors buried in low-temperature co-fired ceramics. J Phys D 36 (2003) 1009-1017
9. Vandamme LKJ, Casier HJ. The 1/f noise versus sheet resistance in poly-Si is similar to poly-SiGe resistors and Au-layers. In: Proceedings of 34th European solid-state device research conference Leuven, Belgium, September 2004. p. 21-3.
10. 2-glass thick resistive film. J Appl Phys 102 (2007) 103718
11. Masoero A, Morten B, Prudenziati M. Stepanescu A. An improved technique of measuring the contact noise in thick film resistors. In: Proceedings of the 10th international conference on noise in physical systems, Akademiai Kiado, Budapest, Hungary; 1990. p. 561-4.
12. Murthy K.S.R.C., and Kumar V.A. Failure mechanisms in bismuth ruthenate resistor systems. J Mater: Sci Mater Electron 1 (1990) 61-71
13. Jakubowska M., and Pitt K. Influence of the contacts and firing process on the properties of thick film resistors on alumina and dielectrics. J Mater Sci: Mater Electron 6 (1995) 75-78
14. Belavic D, Rocak D, Sikula J, Hrovat M, Koktavy B, Pavelka J. Investigation of possible correlation between current noise and long-term stability of thick-film resistors. In: Proceedings of IMAPS-Europe, Prague, June; 2000. p. 464-9.
15. Rocak D., Belavic D., Hrovat M., Sikula J., Koktavy B., Pavelka J., et al. Low-frequency noise of thick-film resistors as quality and reliability indicator. Microelectron Reliab 41 (2001) 531-542
16. Jevtić M.M., Mrak I., and Stanimirović Z. Thick-film quality indicator based on noise index measurements. Microelectron J 30 (1999) 1255-1259
17. Jevtić M.M., Stanimirović Z., and Stanimirović I. Evaluation of thick-film resistor structural parameters based on noise index measurements. Microelectron Reliab 41 (2001) 59-66