SCOPUS 정보 검색 플랫폼

Volumn 573-574, Issue , 2008, Pages 257-267

An overview of ms annealing for deep sub-micron activation

Author keywords

Flash annealing; Laser annealing; ms annealing; RTP; Ultra shallow junctions

Indexed keywords

CHEMICAL ACTIVATION; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SEMICONDUCTOR JUNCTIONS;

DEEP SUB-MICRON; ELECTRICAL ACTIVATION; FLASH ANNEALING; FLASH LAMP ANNEALING; LASER ANNEALING; MILLISECOND ANNEALING; ULTRA SHALLOW JUNCTION;

SEMICONDUCTOR LASERS;

EID: 45749086924 PISSN: 02555476 EISSN: 16629752 Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.573-574.257 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.