Mask transmission resonance in bi-layer masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Philipsen, Vicky ^a   De Bisschop, Peter ^a   Mesuda, Kei ^a,b  

^a IMEC   (Belgium)

^b DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Hyper NA lithography; Mask 3D effects; Mask transmission resonance; Negative MEEF; Wafer evaluation

Indexed keywords

BISMUTH; BISMUTH PLATING; CADMIUM; CADMIUM COMPOUNDS; COMPUTER NETWORKS; CURVES (ROAD); ERROR ANALYSIS; LIGHT; LITHOGRAPHY; MICROFLUIDICS; OPTICS; PHOTOMASKS; STEREOCHEMISTRY; TECHNOLOGY; THREE DIMENSIONAL;

(I ,J) CONDITIONS; BI LAYERS; DIFFRACTION ORDERS; EXPERIMENTAL OBSERVATIONS; GRATING PITCH; IMAGING PERFORMANCE; INCIDENCE ANGLES; INCOMING LIGHT; LINE WIDTHS; LITHOGRAPHIC SIMULATIONS; MASK ERROR ENHANCEMENT FACTOR (MEEF); MASK MATERIALS; MASK TECHNOLOGY; NEXT-GENERATION LITHOGRAPHY (NGL); OPTICAL (PET) (OPET); PHASE SHIFT MASK (PSM); PHOTO MASKING; POLARIZATION STATE (PS); SIZE CURVE; THROUGH-MASK; TRANSMISSION LOSS (TL); TRANSMISSION RESONANCES;

RESONANCE;

EID: 45549109597     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793046     Document Type: Conference Paper

References (8)

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