Observation of negative mask error enhancement factor due to mask transmission resonance

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 7, Issue 2, 2008, Pages

  Philipsen, Vicky ^a   De Bisschop, Peter ^a   Mesuda, Kei ^a  

^a IMEC   (Belgium)

Author keywords

Diffraction spectrum; Hyper NA lithography; Mask 3 D effects; Mask transmission resonance; Negative mask error enhancement factor (MEEF); Resonant type anomaly; Wafer evaluation

Indexed keywords

DIFFRACTION; ELECTROMAGNETIC FIELDS; RESONANCE;

DIFFRACTION SPECTRA; HYPER-NA; NEGATIVE MASK ERROR ENHANCEMENT FACTOR (MEEF); RESONANT-TYPE ANOMALY; WAFER EVALUATION;

MASKS;

EID: 45549088912     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2938993     Document Type: Article

References (2)

1. R. Magnusson and S. S. Wang, "New principle for optical filters," Appl. Phys. Lett. 61(9), 1022-1024 (1992).
2. G. Bao and K. Huang, "Optimal design of guided-mode grating resonance filters," IEEE Photonics Technol. Lett. 16(1), 141-143 (2004).