32nm overlay improvement capabilities

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Eichelberger, Brad ^a   Huang, Kevin ^a   O'Brien, Kelly ^a   Tien, David ^a   Tsai, Frank ^b   Minvielle, Anna ^b   Singh, Lovejeet ^b   Schefske, Jeffrey ^b  

^a KLA TENCOR CORPORATION   (United States)

^b Submicron Development Center   (United States)

Author keywords

High order compensation; Immersion; Overlay metrology; Residual analysis; Sources of variation

Indexed keywords

COMPUTER NETWORKS; MICROFLUIDICS; TECHNOLOGY;

DOUBLE PATTERNING; IMMERSION LITHOGRAPHY (IML); OPTICAL MICRO LITHOGRAPHY; OVERLAY CONTROL; SINGLE LAYERS; STRONG COUPLINGS; TECHNOLOGY ROADMAP;

LITHOGRAPHY;

EID: 45449114204     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773014     Document Type: Conference Paper

References (7)

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7. Mike Adel, Aviv Frommer, Elyakim Kassel, Pavel Izikson, Philippe Leray, Bernd Schulz, Rolf Seitmann, and Jens Busch "In-field overlay uncertainty contributors: a back end study" Proc. SPIE 6152, 615213, (2006)