Hardware, materials, and parameters optimization for improvement of immersion overlay

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 2, 2007, Pages

  Ma, Won Kwang ^a   Hwang, Young Sun ^a   Kang, Eung Kil ^a   Park, Sarohan ^a   Kang, Jung Hyun ^a   Lim, Chang Moon ^a   Moon, Seung Chan ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Alignment; Immersion; Overlay; Top coat; UPW(Ultra Pure Water)

Indexed keywords

IMAGE ANALYSIS; IMAGE RESOLUTION; OPTICAL DESIGN; OPTIMIZATION; PARAMETER ESTIMATION; PROCESS CONTROL;

IMMERSION LITHOGRAPHY; IMMERSION PROCESSES;

LITHOGRAPHY;

EID: 35148834833     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712026     Document Type: Conference Paper

References (2)

1. Ken-ichi Shiraishi., "Basic Studies of Overlay Performance on Immersion Lithography Tool." Proc SPIE 6154 P61540Q, 2006
2. Young-Sun Hwang., "Improvement of Alignment and Overlay Accuracy on Amorphous Carbon Layers." Proc. SPIE, 6152, P615222, 2006.