In situ observation of formation processes of titanium compound thin films due to ion implantation in a transmission electron microscope

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 390-394

  Kasukabe, Y ^a   Dizard, Z L ^a   Fujino, Y ^a   Tani, H ^a   Osaka, M ^a   Yamada, Y ^a   Abe, H ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

EELS; Fcc hcp transformation; In situ TEM; Ion implantation

Indexed keywords

CHEMICAL BONDS; EVAPORATION; FILM GROWTH; ION IMPLANTATION; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

FORMATION PROCESSES;

THIN FILMS;

EID: 0038075250     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00769-9     Document Type: Conference Paper

References (11)

1. Pflüger J., Fink J., Weber W., Bohnen K.-P., Crecelius G. Phys. Rev. B. 30:1984;1155.
2. Sundgren J.E. Thin Solid Films. 128:1985;21.
3. Jiang L., Hanninen H., Paro J., Kauppiene V. Metall. Mater. Trans. A. 27:1996;2796.
4. Chen G.S., Guo J.J., Lin C.K., Hsu C.-S., Yang L.C., Fang J.S. J. Vac. Sci. Technol. A. 20:2002;479.
5. Narayan J., Tiwari P., Chen X., Singh J., Chowdhury R., Zheleva T. App. Phys. Lett. 61:1992;1290.
6. Sano K., Oose M., Kawakubo T. Jpn. J. Appl. Phys. 34:1995;3266.
7. Bøttiger J., Chevallier J., Petersen J.H., Schell N., Matz W., Mücklich A. J. Appl. Phys. 91:2002;5429.
8. Kasukabe Y., Ootubo J., Nagata S., Kishimoto M., Fujino Y., Yamaguchi S., Yamada Y. Jpn. J. Appl. Phys. 34:1995;3234.
9. Kasukabe Y., Takeda S., Fujino Y., Yamada Y., Nagata S., Kishimoto M., Yamaguchi S. J. Vac. Sci. Technol. A. 15:1997;1848.
10. Kasukabe Y., Saito N., Suzuki M., Yamada Y., Fujino Y., Nagata S., Kishimoto M., Yamaguchi S. J. Vac. Sci. Technol. A. 16:1998;3366.
11. H. Abe, H. Naramoto, K. Hojou, S. Furuno, JAERI-Research 96-047, 1996, 1.