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Volumn 270, Issue 3-4, 2004, Pages 376-379
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Diffusion of vanadium in GaAs
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Author keywords
A1. Diffusion; A3. Metalorganic chemical vapor deposition; B1. GaAs; B1. Vanadium
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Indexed keywords
ACTIVATION ENERGY;
CRYSTAL DEFECTS;
DIFFUSION;
DOPING (ADDITIVES);
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTING GALLIUM ARSENIDE;
TRANSITION METALS;
CRYSTAL LATTICE;
DIFFUSION COEFFICIENTS;
GAUSSIAN FITTED CURVES;
UNDOPED LAYERS;
VANADIUM;
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EID: 4544373065
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2004.07.007 Document Type: Article |
Times cited : (17)
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References (21)
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