Combining Ar ion milling with FIB lift-out techniques to prepare high quality site-specific TEM samples

Journal of Microscopy

Volumn 215, Issue 3, 2004, Pages 219-223

  Huang, Z ^a  

^a CRANFIELD UNIVERSITY   (United Kingdom)

Author keywords

Argon ion milling; Focused ion beam milling; Lift out; Transmission electron microscopy

Indexed keywords

AMORPHOUS CARBON; ARGON; CARBON FILMS; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ELECTRONS; ENERGY DISSIPATION; FILM PREPARATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IONS; MILLING (MACHINING);

AR+ IONS; ARGON ION MILLING; FOCUSED ION BEAM MILLING; FOCUSED ION BEAM TECHNIQUE; FOCUSED IONS BEAMS; HIGH-QUALITY SITES; ION MILLING; LIFT OUTS; LIFT-OUT TECHNIQUES; SITE-SPECIFIC;

FOCUSED ION BEAMS;

ARGON; CARBON; COPPER; GALLIUM;

ARTICLE; COATED PARTICLE; ELECTRON ENERGY LOSS SPECTROSCOPY; FOCUSED ION BEAM; MATERIAL COATING; PARTICLE SIZE; PRIORITY JOURNAL; SAMPLE; TECHNIQUE; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY;

ANGUILLIFORMES;

EID: 4544280670     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.0022-2720.2004.01376.x     Document Type: Article

References (9)

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