Large scaled ALD/PECVD reactor for flat panel display application

ECS Transactions

Volumn 11, Issue 7, 2007, Pages 31-38

  Murata, Kazutoshi ^a   Washio, Keisuke ^a   Miyatake, Naomasa ^a   Mori, Yasunari ^a   Tachibana, Hiroyuki ^a   Uraoka, Yukiharu ^b   Fuyuki, Takashi ^b  

^a MITSUI ENGINEERING AND SHIPBUILDING CO LTD   (Japan)

^b NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVES; FILM GROWTH; FLAT PANEL DISPLAYS; GLASS; GROWTH RATE; MONOPOLE ANTENNAS; PHASE INTERFACES; SILICA; SILICON OXIDES; SUBSTRATES; TEMPERATURE; THIN FILM TRANSISTORS;

FORMING GAS ANNEALING; GLASS SUBSTRATES; IMPROVING PERFORMANCE; KEY TECHNOLOGIES; PATTERNED SUBSTRATES; SI/SIO2 INTERFACE; THICKNESS VARIATION; UNIFORM CURRENTS;

ATOMIC LAYER DEPOSITION;

EID: 45249090200     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2779066     Document Type: Conference Paper

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