메뉴 건너뛰기




Volumn 6992, Issue , 2008, Pages

Si moulds for glass and polymer microlenses replication

Author keywords

Glass microlenses; Silicon moulds; Wet etching of silicon

Indexed keywords

CHEMICALS; ETCHING; GLASS; MICROLENSES; MOLDS; NONMETALS; OPTICS; POLYMERS; SILICON; STANDARDS; TECHNOLOGY;

EID: 45149087441     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.783093     Document Type: Conference Paper
Times cited : (12)

References (17)
  • 1
    • 0038990632 scopus 로고
    • 2O micromachining of silicon for lens templates, geodesic lenses, and other applications
    • 2O micromachining of silicon for lens templates, geodesic lenses, and other applications," Opt. Eng. 33 (11), 3578-3588 (1994)
    • (1994) Opt. Eng , vol.33 , Issue.11 , pp. 3578-3588
    • Kendall, D.L.1    Eaton, W.P.2    Manginell, R.3    Digges Jr., T.G.4
  • 2
    • 45149126784 scopus 로고    scopus 로고
    • G. Vdovin, O. Akhzar-Mehr, P.M. Sarro, D.W. de Lima Monteiro, M.Y. Loktev, Arrays of aspherical micromirrors and microlenses fabricated with bulk Si micromachining, in MEMS/MOEMS advances in Photonics Communications, Sensing, Metrology, Packaging and Assembly, U. Behringer, B. Courtois, A.M. Khounsary, D.G. Uttamchadani, Proc. SPIE 4945, 107 (2003)
    • G. Vdovin, O. Akhzar-Mehr, P.M. Sarro, D.W. de Lima Monteiro, M.Y. Loktev, "Arrays of aspherical micromirrors and microlenses fabricated with bulk Si micromachining", in MEMS/MOEMS advances in Photonics Communications, Sensing, Metrology, Packaging and Assembly, U. Behringer, B. Courtois, A.M. Khounsary, D.G. Uttamchadani, Proc. SPIE 4945, 107 (2003)
  • 3
    • 2142669775 scopus 로고    scopus 로고
    • Single-mask fabrication of aspherical optics using KOH anisotropic etch of silicon
    • D.W. de Lima Monteiro, O. Akhzar-Mehr, P.M. Sarro, G. Vdovin, "Single-mask fabrication of aspherical optics using KOH anisotropic etch of silicon", Optic Express, 11, 18, 2244 (2003)
    • (2003) Optic Express , vol.11 , Issue.18 , pp. 2244
    • de Lima Monteiro, D.W.1    Akhzar-Mehr, O.2    Sarro, P.M.3    Vdovin, G.4
  • 4
    • 45149106451 scopus 로고    scopus 로고
    • R. Carrasco, J. A. Dziuban, I. Moreno, C. Gorecki, L. Nieradko, R. Walczak, M. Kopytko and M. Jozwik, Optical microlenses for MOEMS, from the conference Microtechnologies for the New Millennium 2005, SPIE Europe Sevilla (2005)
    • R. Carrasco, J. A. Dziuban, I. Moreno, C. Gorecki, L. Nieradko, R. Walczak, M. Kopytko and M. Jozwik, "Optical microlenses for MOEMS", from the conference "Microtechnologies for the New Millennium 2005", SPIE Europe Sevilla (2005)
  • 5
    • 0029296706 scopus 로고
    • Silicon anisotropic etching in KOH-isopropanol etchant
    • Barycka, I. Zubel, "Silicon anisotropic etching in KOH-isopropanol etchant" Sensors and Actuators A 48, 229-238 (1995)
    • (1995) Sensors and Actuators A , vol.48 , pp. 229-238
    • Barycka, I.Z.1
  • 6
    • 0032186826 scopus 로고    scopus 로고
    • Silicon anisotropic etching in alkaline solutions II. On the influence of anisotropy on the smoothness of etched surfaces
    • Zubel, "Silicon anisotropic etching in alkaline solutions II. On the influence of anisotropy on the smoothness of etched surfaces" Sensors and Actuators A 70, 260-268 (1998)
    • (1998) Sensors and Actuators A , vol.70 , pp. 260-268
    • Zubel1
  • 7
    • 0034247280 scopus 로고    scopus 로고
    • Silicon anisotropic etching in alkaline solutions III. On the possibility of spatial structures forming in the course of Si (100) anisotropic etching in KOH and KOH+IPA solutions
    • Zubel, "Silicon anisotropic etching in alkaline solutions III. On the possibility of spatial structures forming in the course of Si (100) anisotropic etching in KOH and KOH+IPA solutions" Sensors and Actuators A 84, 116-125 (2000)
    • (2000) Sensors and Actuators A , vol.84 , pp. 116-125
    • Zubel1
  • 8
    • 0035128210 scopus 로고    scopus 로고
    • Silicon anisotropic etching in alkaline solutions VI. The effect of organic and inorganic agents on silicon anisotropic etching process
    • Zubel, "Silicon anisotropic etching in alkaline solutions VI. The effect of organic and inorganic agents on silicon anisotropic etching process" Sensors and Actuators A 87, 163-171 (2001)
    • (2001) Sensors and Actuators A , vol.87 , pp. 163-171
    • Zubel1
  • 9
    • 0037931982 scopus 로고    scopus 로고
    • The model of etching of (hkl) planes in monocrystalline silicon
    • Zubel, "The model of etching of (hkl) planes in monocrystalline silicon", J.Electrocem.Soc. 150, 391 (2003)
    • (2003) J.Electrocem.Soc , vol.150 , pp. 391
    • Zubel1
  • 13
    • 45149107829 scopus 로고    scopus 로고
    • D.I. Pommerantz, Anodic bonding, USA patent, 3397278, 13 July (1968)
    • D.I. Pommerantz, "Anodic bonding", USA patent, 3397278, 13 July (1968)
  • 15
    • 0036544032 scopus 로고    scopus 로고
    • Microplastic embossing process: Experimental and theoretical characterizations
    • X. J. Shen, L. Pan, L. Lin, "Microplastic embossing process: experimental and theoretical characterizations", Sensors and Actuators A, 97-98 428-433 (2002)
    • (2002) Sensors and Actuators A , vol.97-98 , pp. 428-433
    • Shen, X.J.1    Pan, L.2    Lin, L.3
  • 16
    • 84975664464 scopus 로고
    • Technique for monolithic fabrication of microlens arrays
    • Z. Popovic, R. Sprague and G.A. Neville Conell, "Technique for monolithic fabrication of microlens arrays", App. Optics, 23, 1281-1284 (1988)
    • (1988) App. Optics , vol.23 , pp. 1281-1284
    • Popovic, Z.1    Sprague, R.2    Neville Conell, G.A.3
  • 17
    • 0000079019 scopus 로고    scopus 로고
    • Alignment of mask patterns to crystal orientation
    • Ensell G.: "Alignment of mask patterns to crystal orientation" Sensors and Actuators A 53, 345-348 (1996)
    • (1996) Sensors and Actuators A , vol.53 , pp. 345-348
    • Ensell, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.