Leakage current and paramagnetic defects in SiCN dielectrics for copper diffusion barriers

Applied Surface Science

Volumn 254, Issue 19, 2008, Pages 6222-6225

  Kobayashi, Kiyoteru ^a   Yokoyama, Hisashi ^a   Endoh, Masato ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

Copper diffusion barrier; ESR; LSI; SiCN

Indexed keywords

COPPER; CRYSTAL SYMMETRY; DIFFUSION BARRIERS; ELECTRON SPIN RESONANCE SPECTROSCOPY; LEAKAGE (FLUID); MAGNETIC MOMENTS; PARAMAGNETIC RESONANCE; PARAMAGNETISM; SILICON NITRIDE;

AS-GROWN; COPPER DIFFUSION BARRIER; CURRENT INCREASE; G-VALUES; PARAMAGNETIC DEFECTS; SI-C-N FILMS; SICN; UV ILLUMINATIONS;

IODINE COMPOUNDS;

EID: 45049083883     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.02.144     Document Type: Article

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