SCOPUS 정보 검색 플랫폼

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6993, Issue , 2008, Pages

Technology development for micromirror arrays with high optical fill factor and stable analogue deflection integrated on CMOS substrates

(6) Schmidt, Jan Uwe a Friedrichs, Martin a Bakke, Thor b Voelker, Benjamin c Rudloff, Dirk a Lakner, Hubert a

a FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS (Germany)

b SINTEF ICT (Norway)

c AEMtec GmbH (Germany)

Author keywords

MEMS on CMOS; Multilayer mirror; Spatial light modulator; Wafer bonding

Indexed keywords

ACTUATORS; ADAPTIVE OPTICS; ALUMINUM; COMPOSITE MICROMECHANICS; COMPUTER NETWORKS; ELECTROCHEMICAL SENSORS; MACHINING; MASKS; MEMS; MICROANALYSIS; MICROFLUIDICS; MICROMACHINING; MIRRORS; SILICON; TECHNOLOGICAL FORECASTING; TECHNOLOGY; TITANIUM ALLOYS; TITANIUM COMPOUNDS;

CMOS PROCESSING; CMOS TECHNOLOGIES; DEFLECTION (OVALIZATION); DRESDEN; FILL FACTOR (FF); FRAUNHOFER (CO); HIGH-VOLTAGE (HV); LAYER-TRANSFER (LT); LITHOGRAPHIC MASKS; MICRO-MIRRORS; MICROMECHANICAL MIRROR ARRAYS; MICROMIRROR ARRAY (MMA); MULTILAYER (ML); OPTICAL (PET) (OPET); SACRIFICIAL LAYERS; SINGLE-CRYSTALLINE; TECHNOLOGY DEVELOPMENT (TD);

MICROELECTROMECHANICAL DEVICES;

EID: 44949227031 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.787015 Document Type: Conference Paper

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.