Nanoscale Ta-based diffusion barrier thin-films and their resistance properties

Science in China, Series E: Technological Sciences

Volumn 51, Issue 7, 2008, Pages 1017-1023

  Zhou, Jicheng ^a   Chen, Haibo ^a   Li, Youzhen ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Cu diffusion barrier; DC magnetron sputtering; Nanoscale Ta based thin films; Resistance property

Indexed keywords

AGGLOMERATION; COAGULATION; DIFFUSION BARRIERS; ELECTRIC RESISTANCE; ELECTRIC RESISTANCE MEASUREMENT; HEALTH; MULTILAYER FILMS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; SEMICONDUCTOR DOPING; SILICON; STRUCTURAL PROPERTIES; SURFACE PROPERTIES; SURFACE STRUCTURE; TANTALUM; TUNGSTEN; X RAY DIFFRACTION ANALYSIS;

(1 1 0) SURFACE; DC-MAGNETRON SPUTTERING; EXPERIMENTAL RESULTS; FOUR POINT PROBE (FPP); HALIDE LAMP; HIGH RESISTANCE; MULTI LAYER STRUCTURES; NANO SCALING; P-TYPE SI; RESISTANCE PROPERTIES; SEM/EDS; SHEET RESISTANCE MEASUREMENTS; STABILIZATION EFFECTS;

MAGNETRON SPUTTERING;

EID: 44949189722     PISSN: 10069321     EISSN: 1862281X     Source Type: Journal    
DOI: 10.1007/s11431-008-0089-6     Document Type: Article

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