Microstructure and shape-memory behavior of annealed Ti 51.5 Ni33.1 Cu15.4 thin films

Philosophical Magazine Letters

Volumn 86, Issue 1, 2006, Pages 13-20

  Ishida, A ^a   Sato, M ^a   Ogawa, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; MICROSTRUCTURE; PHASE TRANSITIONS; SHAPE MEMORY EFFECT; SPUTTERING; STRAIN MEASUREMENT; TEMPERATURE DISTRIBUTION; THIN FILMS;

ANNEALING TEMPERATURE; RESIDUAL STRAIN; SHAPE-MEMORY BEHAVIOR;

TITANIUM COMPOUNDS;

EID: 32644454760     PISSN: 09500839     EISSN: None     Source Type: Journal    
DOI: 10.1080/09500830500482308     Document Type: Article

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