Enhanced nucleation and decreased growth rates of Cu2O in Cu0.5Au0.5 (001) thin films during in situ oxidation

Journal of Materials Research

Volumn 20, Issue 7, 2005, Pages 1902-1909

  Wang, Liang ^a   Yang, Judith C ^a  

^a University of Pittsburgh   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COMPUTER SIMULATION; LATTICE CONSTANTS; LOW ENERGY ELECTRON DIFFRACTION; NUCLEATION; OXIDATION; SINGLE CRYSTALS; STRAIN; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAHIGH VACUUM;

LATTICE MISMATCH; NUCLEATION ACTIVATION ENERGY; SINGLE CRYSTAL THIN FILM;

COPPER ALLOYS;

EID: 29044448129     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2005.0237     Document Type: Article

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