Temperature effect on low-k dielectric thin films studied by ERDA

Journal of Physics: Conference Series

Volumn 100, Issue 1, 2008, Pages

  Jensen, J ^a   Possnert, G ^a   Zhang, Y ^b  

^a UPPSALA UNIVERSITY   (Sweden)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; HYDROGEN; LOW-K DIELECTRIC; NANOSCIENCE; NITRIDES; SEMICONDUCTOR DEVICES; SILICA; SILICATES; SILICON NITRIDE; SILICON OXIDES; THIN FILMS;

COMPOSITIONAL CHANGES; DEGRADATION MECHANISM; ELASTIC RECOIL DETECTION ANALYSIS; ELEMENTAL COMPOSITIONS; ELEVATED TEMPERATURE; LOW-K DIELECTRIC THIN FILMS; SILICON NITRIDE (SIN); SILICON OXYNITRIDES;

DIELECTRIC MATERIALS;

EID: 44649104592     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/100/1/012041     Document Type: Article

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