Fabrication of 3-D curved microstructures by constrained gas expansion and photopolymerization

Langmuir

Volumn 24, Issue 10, 2008, Pages 5492-5499

  Chan Park, Mary B ^a,b   Yang, Chun ^b   Guo, Xun ^b   Chen, L Q ^a   Yoon, Soon Fatt ^b,c   Chun, Jung Hoon ^b,d  

^a Nanyang Technological University   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMERICAN CHEMICAL SOCIETY (ACS); ARGON GAS; BLIND HOLES; EXPERIMENTAL DATA; GAS EXPANSION; HIGH QUALITY (HQ); LIQUID RESINS; MICRO-LENS ARRAYS; NOVEL METHODS; PHOTOCURABLE; RAPIDLY SOLIDIFIED; SIMPLE MODELING; THREE DIMENSIONAL (3D);

ARGON; FABRICATION; FLUIDS; FORECASTING; GASES; INERT GASES; LITHOGRAPHY; MATHEMATICAL MODELS; MICROOPTICS; MICROSTRUCTURE; MORPHOLOGY; PHOTOPOLYMERIZATION; POLYMERIZATION; PREHEATING; RAPID SOLIDIFICATION; RESINS;

THREE DIMENSIONAL;

ARGON; BAYSILON; BIOMATERIAL; DIMETICONE; NYLON; POLY(DIMETHYLSILOXANE) POLYAMIDE COPOLYMER; POLY(DIMETHYLSILOXANE)-POLYAMIDE COPOLYMER; POLYMER; SILASTIC; SILICONE DERIVATIVE;

ARTICLE; CHEMISTRY; GAS; MATERIALS TESTING; MICROFLUIDICS; SCANNING ELECTRON MICROSCOPY; STATISTICAL MODEL; SURFACE PROPERTY; TEMPERATURE; ULTRAVIOLET RADIATION; WETTABILITY;

ARGON; BIOCOMPATIBLE MATERIALS; DIMETHYLPOLYSILOXANES; GASES; MATERIALS TESTING; MICROFLUIDICS; MICROSCOPY, ELECTRON, SCANNING; MODELS, STATISTICAL; NYLONS; POLYMERS; SILICONE ELASTOMERS; SILICONES; SURFACE PROPERTIES; TEMPERATURE; ULTRAVIOLET RAYS; WETTABILITY;

EID: 44649098281     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la703608p     Document Type: Article

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