Technique for monolithic fabrication of microlens arrays

Applied Optics

Volumn 27, Issue 7, 1988, Pages 1281-1284

  Popovic, Zoran D ^a   Sprague, Robert A ^b   Neville Connell, G A ^b  

^a XEROX RESEARCH CENTRE OF CANADA   (Canada)

^b PALO ALTO RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84975664464     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.27.001281     Document Type: Article

References (7)

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2. M. Oikawa, K. Iga, T. Sanada, N. Yamamoto, and K. Nishizawa, “Array of Distributed-Index Planar Micro-Lenses Prepared from Ion Exchange Technique,” Jpn. J. Appl. Phys. 20, L296 (1981).
3. N. F. Borrelli, D. L. Morse, R. H. Bellman, and W. L. Morgan, “Photolytic Technique for Producing Microlenses in Photosensitive Glass,” Appl. Opt. 24, 2520 (1985).
4. O. Wada, S. Yamakoshi, M. Abe, Y. Nishitani, and T. Sakurai, “High Radiance InGaAsP/InP LED’s for Optical Communication Systems at 1.2-1.3 Mm,” IEEE J. Quantum Electron. QE-17, 174 (1981).
5. Y. Ishihara and K. Tanigaki, “A High Photosensitivity IL-CCD Image Sensor with Monolithic Resin Lens Array,” in Proceedings, International Electron Devices Meeting, Washington, DC (Sept. 1983), pp. 497-500.
6. J. F. Oliver, C. Huh, and S. G. Mason, “Resistance to Spreading of Liquids by Sharp Edges,” J. Colloid Interface Sci. 59, 568 (1977).
7. R. Allen, M. Foster, and Y. Yen, “Deep U.V. Hardening of Positive Photoresist Patterns,” J. Electrochem. Soc. 129, 1379 (1982).