Structural characterization of Mn implanted AlInN

Journal of Physics D: Applied Physics

Volumn 41, Issue 11, 2008, Pages

  Majid, Abdul ^a   Ali, Akbar ^a   Zhu, J J ^b   Wang, Y T ^b  

^a QUAID I AZAM UNIVERSITY   (Pakistan)

^b INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; DECOMPOSITION; DIFFUSION; GALLIUM NITRIDE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; X RAY DIFFRACTION;

ATOMIC DIFFUSION; INDUCED STRAIN; SATURATION VALUE;

THIN FILMS;

EID: 44449092470     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/11/115404     Document Type: Article

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