The magnitude of potential exposure-tool-induced critical dimension and overlay errors in double dipole lithography for the 65-nm and 45-nm technology nodes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3672-3679

  Chiou, Tsann Bim ^a   Chen, Alek C ^a   Tseng, Shih En ^a   Eurlings, Mark ^b   Hendrickx, Eric ^c   Hsu, Stephen ^d  

^a ASMI Technol Devmt Center Asia   (Taiwan)

^b ASML   (Netherlands)

^c IMEC   (Belgium)

^d ASML US Inc   (United States)

Author keywords

Critical dimension uniformity (CDU); Double dipole lithography (DDL); Image placement errors (IPEs); Low k1; Monte Carlo model; Overlay error; Pole intensity imbalance (PIB); Telecentricity

Indexed keywords

CRITICAL DIMENSION UNIFORMITY (CDU); DOUBLE DIPOLE LITHOGRAPHY (DDL); IMAGE PLACEMENT ERRORS; LOW-K1; MONTE CARLO MODELS; OVERLAY ERRORS; POLE INTENSITY IMBALANCE (PIB); TELECENTRICITY;

APPLICATION SPECIFIC INTEGRATED CIRCUITS; COMPUTER SIMULATION; ERROR ANALYSIS; IMAGING TECHNIQUES; MASKS; MATHEMATICAL MODELS; MONTE CARLO METHODS; OPTICAL RESOLVING POWER; OPTIMIZATION; REFRACTIVE INDEX; SHRINKAGE;

PHOTOLITHOGRAPHY;

EID: 4444264399     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3672     Document Type: Conference Paper

References (10)

1. DDL is a trademark of ASML Masktools.
2. M. Eurlings, E. van Setten, J. A. Torres, M. Dusa, R. Socha, L. Capodieci and J. Finders: SPIE 4404 (2001) 266.
3. S. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. F. Chen, J. Finders, R. J. Socha and M. Dusa: SPIE 4691 (2002) 476.
4. S. Hsu, J. F. Chen, N. Cororan, W. Knose, D. J. Van Den Broeke, T. Laidig, K. E. Wampler, X. Shi, M. Hsu, M. Eurlings, J. Finders, T. B. Chiou, R. J. Socha, W. Conley, Y. W. Hsieh, S. Tuan and F. Hsieh: SPIE 5040 (2003) 215.
5. ASML PAS 5500 is a trademark of ASML.
6. Klarity ProDATA is a trademark of KLA-Tencor.
7. PROLITH is a trademark of KLA-Tencor.
8. D. Flagello, J. de Klerk, G. Davies, R. Rogoff, B. Geh, M. Arnz. U. Wegmann and M. Kraemer: SPIE 3051 (1997) 672.
9. P. Graupner, R. Garreis, A. Gohnermeier, T. Heil, M. Lowisch and D. Flagello: SPIE 5040 (2003) 119.
10. N. Kachwala, J. S. Petersen, J. F. Chen, M. Canjemi and M. McCallum: SPIE 3679 (1999) 55.