Imaging contrast improvement for 160 nm line features using sub resolution assist features with binary, 6% ternary attenuated phase shift mask with process tuned resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 55-67

  Kachwala, Nishrin ^a   Petersen, John S ^a   Chen, J Fung ^a   Canjemi, Mike ^a   McCallum, Martin ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE ANALYSIS; MASKS;

OPTICAL PROXIMITY CORRECTION (OPC); PHASE SHIFT MASKS (PSM); SUB RESOLUTION ASSIST FEATURES (SRF);

PHOTORESISTS;

EID: 0032632129     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (10)