Thermal conductivity measurements of low-k films using thermoreflectance phenomenon

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 796-799

  Kuwahara, M ^a   Suzuki, O ^a   Takada, S ^a   Hata, N ^a   Fons, P ^a   Tominaga, J ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Low k; Methyl group; Porous silica; Temperature dependence; Thermal conductivity; Thermoreflectance

Indexed keywords

MEASUREMENT THEORY; PERMITTIVITY; TEMPERATURE DISTRIBUTION; THERMAL CONDUCTIVITY; THERMAL EFFECTS;

METHYL GROUP; POROUS SILICA; TEMPERATURE DEPENDENCE; THERMOREFLECTANCE;

DIELECTRIC FILMS;

EID: 44149121974     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.053     Document Type: Article

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