Simulation of mask proximity printing

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 6, Issue 2, 2007, Pages

  Meliorisz, Bálint ^a   Erdmann, Andreas ^b  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Fourier transforms; Process optimization; Proximity printing; Rigorous electromagnetic modeling

Indexed keywords

FOURIER TRANSFORMS; OPTIMIZATION; PHOTORESISTS; PRINTING;

MASK TOPOGRAPHY EFFECTS; PROXIMITY PRINTING; RIGOROUS ELECTROMAGNETIC MODELING;

PHOTOMASKS;

OPTIMIZATION; PRINTING;

EID: 34548027522     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2727475     Document Type: Article

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