Simulation of proximity and contact lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 733-736

  Meliorisz, Bálint ^a,b   Evanschitzky, Peter ^a   Erdmann, Andreas ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Mask proximity printing; Process optimization; Process simulation

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; DIFFRACTION; ERROR ANALYSIS; MAGNETOELECTRIC EFFECTS; OPTIMIZATION; PRINTING;

MASK PROXIMITY PRINTING; PROCESS SIMULATION; SCALAR DIFFRACTION ANALYSIS;

LITHOGRAPHY;

LITHOGRAPHY; OPTIMIZATION; PRINTING; SIMULATION;

EID: 34247647554     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.125     Document Type: Article

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