Fabrication of nanoline arrays of noble metals by electroless plating and selective etching process

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 321, Issue 1-3, 2008, Pages 238-243

  Miyoshi, Kentaro ^a   Fujikawa, Shigenori ^a   Kunitake, Toyoki ^a  

^a RIKEN   (Japan)

Author keywords

Composite; Electroless plating; Fabrication; Nanowire; Noble metal

Indexed keywords

COPPER; ELECTROLESS PLATING; ETCHING; METALLIC FILMS; NANOELECTRONICS; PRECIOUS METALS; SYNTHESIS (CHEMICAL);

BILAYER STRUCTURE; METALLIC LAYERS; NANOLINE ARRAYS;

NANOWIRES;

COPPER; GOLD; OXYGEN; SILICON; SILVER;

ANALYTIC METHOD; ARTICLE; ELECTROLESS PLATING; ETCHING PROCESS; PRIORITY JOURNAL;

EID: 43949138601     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2007.11.041     Document Type: Article

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