Preparation of CuCl microcrystals-doped SiO2 glass by co-sputtering method

Applied Physics Letters

Volumn , Issue , 1995, Pages 1020-

  Takami, Seiichi ^a   Egashira, Yasuyuki ^a   Honma, Itaru ^a,b   Komiyama, Hiroshi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

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EID: 36448999163     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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