Stoichiometry control of sputtered CuCl thin films: Influence on ultraviolet emission properties

Journal of Applied Physics

Volumn 100, Issue 9, 2006, Pages

  Natarajan, Gomathi ^a   Rajendra Kumar, R T ^a   Daniels, S ^a   Cameron, D C ^b   McNally, P J ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b LAPPEENRANTA UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COMPOUNDS; ION BOMBARDMENT; LIGHT EMISSION; LUMINESCENCE; MICROSTRUCTURE; OPTICAL PROPERTIES; SPUTTERING; STOICHIOMETRY; ULTRAVIOLET RADIATION;

COPPER CHLORIDE; CRYSTALLINE PROPERTIES; OPTICAL QUALITY; STOICHIOMETRIC FILMS;

THIN FILMS;

EID: 33751109221     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2364665     Document Type: Article

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