Developing new manufacturing methods for the improvement of AlF3thin films

Optics Express

Volumn 16, Issue 10, 2008, Pages 6904-6909

  Lee, Cheng Chung ^a   Liao, Bo Huei ^a   Liu, Ming Chung ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTICAL PROPERTIES; PLASMA ETCHING; SURFACE ROUGHNESS; THIN FILMS;

EXTINCTION COEFFICIENTS; OPTICAL QUALITY;

SEMICONDUCTOR DEVICE MANUFACTURE;

ALUMINUM DERIVATIVE; ALUMINUM FLUORIDE; CARBON DIOXIDE; FLUORIDE; ION; NANOMATERIAL; OXYGEN; SILICON DIOXIDE;

ARTICLE; AUDIOVISUAL EQUIPMENT; CHEMISTRY; EQUIPMENT DESIGN; MAGNETISM; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; OPTICS; SPECTROPHOTOMETRY; SURFACE PROPERTY;

ALUMINUM COMPOUNDS; CARBON DIOXIDE; EQUIPMENT DESIGN; FLUORIDES; IONS; MAGNETICS; MATERIALS TESTING; MOTION PICTURES AS TOPIC; NANOSTRUCTURES; NANOTECHNOLOGY; OPTICS; OXYGEN; QUARTZ; SPECTROPHOTOMETRY; SURFACE PROPERTIES;

EID: 43849109949     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.006904     Document Type: Article

References (12)

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