Process for deposition of AlF3 thin films

Applied Optics

Volumn 47, Issue 13, 2008, Pages

  Liao, Bo Huei ^a   Liu, Ming Chung ^a   Lee, Cheng Chung ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FLUORINE COMPOUNDS; MICROSTRUCTURE; OPTICAL PROPERTIES; SPUTTERING;

ALUMINUM FLUORIDE; DEPOSITION PROCESS; DIFFERENT SUBSTRATES; EXTINCTION COEFFICIENTS; OPTICAL QUALITIES; PROPERTIES AND MICROSTRUCTURES; PULSED DC MAGNETRON SPUTTERING; STANDARD TEMPERATURE AND PRESSURES;

THIN FILMS;

EID: 43849099342     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.000C41     Document Type: Article

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