Calibration strategies for overlay and registration metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 103-120

  Silver, R M ^a   Stocker, M ^a   Attota, R ^a   Bishop, M ^b   Jun, J ^a   Marx, E ^a   Davidson, M ^c   Larrabee, R ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

^c Spectel Research Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; CHARGE COUPLED DEVICES; OPTICAL INSTRUMENTS; PERFORMANCE; SEMICONDUCTOR DEVICE MANUFACTURE; STATISTICAL METHODS;

CRITICAL DIMENSION; OVERLAY METROLOGY; REPEATABILITY;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141501044     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.488486     Document Type: Conference Paper

References (13)

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11. S. Fox, E. Kornegay, and R. Silver, "Characterization of Imaging Optics and CCD Cameras for Metrology Applications, ULSI Conf. Proc., NIST 2000.
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