Energy transport in plasma etching of nanoporous dielectric materials

Superlattices and Microstructures

Volumn 35, Issue 3-6, 2004, Pages 195-204

  Plawsky, Joel ^a   Ponoth, Shom ^a   Dalakos, George ^a   Malek, Kourosh ^b   Coppens, Marc Olivier ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Diffusion and reaction; Nanoporous solids; Plasma etching

Indexed keywords

CHEMICAL ACTIVATION; DIELECTRIC MATERIALS; FUNCTIONS; INTEGRATED CIRCUITS; MATHEMATICAL MODELS; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; POROSITY; PRESSURE EFFECTS; SILICA;

DIFFUSION AND REACTION; ETCH RATE; NANOPOROUS SOLIDS;

PLASMA ETCHING;

EID: 4344647496     PISSN: 07496036     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.spmi.2003.10.001     Document Type: Conference Paper

References (17)

1. Hong J.-K., Yang H.-S., Jo M.-H., Park H.-H., Choi S.-Y. Thin Solid Films. 308-309:1997;495.
2. Nitta S.V., Pisupatti V., Jain A., Wayner P.C. Jr., Gill W.N., Plawsky J.L. J. Vac. Sci. Tech. B. 17:1999;205.
3. Jain A., Rogojevic S., Ponoth S., Plawsky J.L., Gill W.N., Simonyi E., Chen S.-T. J. Appl. Phys. 91:2002;3275.
4. Jain A., Rogojevic S., Gill W.N., Plawsky J.L. J. Appl. Phys. 90:2001;5832-5834.
5. Jain A., Rogojevic S., Ponoth S., Agarwal N., Matthew I., Gill W.N., Persans P., Tomozawa M., Plawsky J.L., Simonyi E. Thin Solid Films. 389-399:2001;513.
6. Lieberman M.A., Lichtenberg A.J. Principles of Plasma Discharges and Materials Processing. 1994;John Wiley & Sons, New York.
7. Malek K., Coppens M.-O. Phys. Rev. Lett. 87:2001;125505.
8. Malek K., Coppens M.-O. Coll. Surf. A. 206:2002;335.
9. Standaert T.E.F.M., Joseph E.A., Oehrlein G.S., Jain A., Gill W.N., Wayner P.C. Jr., Plawsky J.L. J. Vac. Sci. Tech. A. 18:2000;2742.
10. Bariya A.J., Frank C.W., McVittie J.P. J. Electrochem. Soc. 137:1990;2575.
11. Standaert T.E.F.M., Schaepkens M., Rueger N.R., Sebel P.G.M., Oehrlein G.S., Cook J.M. J. Vac. Sci. Tech. A. 15:1997;1881.
12. Miyata K., Hori M., Goto T. J. Vac. Sci. Tech. A. 14:1996;2083.
13. Sankaran A., Kushner M.J. Appl. Phys. Lett. 82:2003;1824.
14. Thompson B.E., Sawin H.H., Fisher D.A. J. Appl. Phys. 63:1988;2241.
15. Grapperhaus M.J., Kushner M.J. J. Appl. Phys. 81:1997;569.
16. Zhang D., Kushner M.J. J. Appl. Phys. 87:2000;1060.
17. Zhang D., Kushner M.J. J. Vac. Sci. Tech. A. 19:2001;524.