Quantum lithography, entanglement and Heisenberg-limited parameter estimation

Journal of Optics B: Quantum and Semiclassical Optics

Volumn 6, Issue 8, 2004, Pages

  Kok, Pieter ^a   Braunstein, Samuel L ^b   Dowling, Jonathan P ^c  

^a HEWLETT PACKARD LABORATORIES   (United Kingdom)

^b UNIVERSITY OF YORK   (United Kingdom)

^c CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Quantum imaging; Quantum metrology; Shot noise; Standard quantum limit

Indexed keywords

QUANTUM IMAGING; QUANTUM LITHOGRAPHY; QUANTUM METROLOGY; STANDARD QUANTUM LIMIT;

LITHOGRAPHY; PARAMETER ESTIMATION; PHASE SHIFT; PHOTORESISTS; RAYLEIGH SCATTERING; REFRACTION;

QUANTUM OPTICS;

EID: 4344641320     PISSN: 14644266     EISSN: None     Source Type: Journal    
DOI: 10.1088/1464-4266/6/8/029     Document Type: Conference Paper

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