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Volumn 185, Issue 3-4, 2002, Pages 161-171

The origin of haze in CVD tin oxide thin films

Author keywords

AFM; Haze; Internal defects; Polishing; Rugosity; Tin oxide thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; DEFECTS; DOPING (ADDITIVES); GLAZES; POLISHING; SOLAR CONTROL FILMS; SUBSTRATES; SURFACE ROUGHNESS; TIN COMPOUNDS;

EID: 0037080271     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00554-2     Document Type: Article
Times cited : (40)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.