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Volumn 185, Issue 3-4, 2002, Pages 161-171
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The origin of haze in CVD tin oxide thin films
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Author keywords
AFM; Haze; Internal defects; Polishing; Rugosity; Tin oxide thin films
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
CONDUCTIVE FILMS;
DEFECTS;
DOPING (ADDITIVES);
GLAZES;
POLISHING;
SOLAR CONTROL FILMS;
SUBSTRATES;
SURFACE ROUGHNESS;
TIN COMPOUNDS;
OXIDE THIN FILMS;
THIN FILMS;
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EID: 0037080271
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(01)00554-2 Document Type: Article |
Times cited : (40)
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References (7)
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