Effects of the substrate crystals upon the structure of thermal oxide layers on Si

Crystal Research and Technology

Volumn 33, Issue 4, 1998, Pages 637-642

  Shimura, T ^a   Sensui, H ^a   Umeno, M ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ATOMIC STRUCTURE; CRYSTAL GROWTH; ELECTROMAGNETIC WAVE REFLECTION; SEMICONDUCTOR GROWTH; SILICON WAFERS; THIN FILMS; X RAYS;

BRAGG REFLECTIONS; THERMAL OXIDE THIN FILMS;

OXIDES;

EID: 0032303518     PISSN: 02321300     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

1. FURUMURA, Y.: Proc. of the 2nd Int. Symp. on Advanced Science and Technology of Silicon Materials (1996) Ed. M. Umeno, The 145th Committee of the Japan. Soc. for Promotion of Sci., Tokyo, p. 418
2. IIDA, Y., SHIMURA, T., HARADA, J., SAMATA, S., MATSUSHITA, Y.: Surf. Sci. 258 (1991) 235
3. ITSUMI, M., AKIYA, H., UEKI, T., TOMITA, M., YAMAWAKI, T.: J. Appl. Phys. 78 (1995) 5984
4. ITSUMI, M., KIYOSUMI, F.: Appl. Phys. Lett. 40 (1982) 496
5. OURMAZD, A., TYLOR, D. W., RENTSCHLER, J. A., BEVK, J.: Phys. Rev. Lett. 59 (1987) 213
6. ROCHET, F., FROMENT, M., D'ANTERROCHES, C., ROULET, H., DUFOUR, G.: Phil. Mag. B, 59 (1989) 339
7. SADAMITSU, S., UMENO, S., KOIKE, Y., HOURAI, M., SUMITA, S., SHIGEMATSU, T.: Jpn. J. Appl. Phys. 32 (1993) 3675
8. SHIMURA, T., MISAKKI, H., UMENO, M., TAKAHASHI, I., HARADA, J.: J. Cryst. Growth 166 (1996) 786
9. SHIMURA, T., SENSUI, H., UMENO, M.: Proc. of the 2nd Int. Symp. on Advanced Science and Technology of Silicon Materials (1996) Ed. M. Umeno, The 145th Committee of the Japan. Soc. for Promotion of Sci., Tokyo, p. 371
10. 2 Interface 3 (1996) Eds. H. Z. Massoud, E. H. Poindexter, and C. R. Helms, The Electrochemical Society, Pennington, NJ, p. 456
11. TAKAHASHI, T., SHIMURA, T., HARADA, J.: J. Phys.: Condens. Matter 5 (1993) 6525